Work Activities

This fully funded PhD position bridges fundamental physics and industrial application, forming part of the European Research Council's Consolidator Grant titled “Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography (MOORELIGHT)”.

Background
Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at a wavelength of 13.5nm. The groundbreaking introduction of EUV lithography (EUVL) resulted from decades of collaboration between industry and science, akin to the Project Apollo of the digital age. EUVL relies on light produced by high-energy CO2-gas laser pulses interacting with molten tin microdroplets, but this method has low overall efficiency in converting electrical power to useful EUV light. Substituting gas lasers with more efficient solid-state lasers could significantly enhance efficiency and output power. However, the optimal laser wavelength and plasma 'recipe' remain unclear due to a lack of understanding of the underlying complex physics. Project MOORELIGHT aims to provide this critical insight.

Project Goal
EUV-emitting laser-produced plasmas are generated from tin targets precisely shaped by a series of laser “pre-pulses”. The ability to shape and control these tin targets is crucial for the efficient generation of EUV light for current and future light sources. This capability stems from understanding the driving physical processes.

You will join an interdisciplinary team of several PhD students and postdocs, aiming to design and execute experiments to understand the fluid dynamic fragmentation and vaporization of laser-impacted thin liquid tin targets. The goal is to uncover what happens when a laser pulse hits a tin droplet. This new understanding of fluid dynamics will enhance laser-target tailoring capabilities, enabling optimal coupling of laser light to produce hot-and-dense plasma. You and the team will be responsible for setting up, executing, analyzing, and interpreting these experiments. Collaboration with fluid dynamics computationalists and theorists from the Jalaal group at the University of Amsterdam will be a key part of your work.

Qualifications

You should have (or soon obtain) an MSc in physics or applied physics. Knowledge of fluid mechanics and/or experimental laser physics is advantageous. Programming skills in Python are welcome. Good verbal and written communication skills in English are required.

Work Environment

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. Located at the Amsterdam Science Park, ARCNL has approximately 100 scientists and support staff. More information is available at www.arcnl.nl.

The EUV Plasma Processes group's research activities aim to understand the atomic- and molecular-level dynamics of plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

Working Conditions

This full-time (40 hours/week, 12 months/year) appointment at the Netherlands Foundation of Scientific Research Institutes (NWO-I) lasts four years, with a starting salary of €2,781 per month gross and a range of employment benefits. Successful completion of the PhD research will result in a PhD degree from a Dutch University. Non-Dutch applicants may benefit from the favorable '30% ruling' tax agreement. ARCNL assists new foreign PhD students with housing and visa applications and compensates their transport costs and furnishing expenses.

ARCNL also offers:

• Responsibility over a setup including state-of-the-art droplet generators and laser systems.
• The ability to enhance experimental skills through extensive experimental campaigns with significant freedom in design.
• Collaboration with the in-house theory group for a thorough understanding of target dynamics.
• Access to a wide range of existing (image) data analysis tools to develop data analysis skills.
• Cooperation within a large team of PhD students, postdocs, and a major industrial partner.

More Information?

For further details about the position, please contact:

Dr. Oscar Versolato
Group Leader, EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Application

Respond to this vacancy online via the button below. Please include:

• Resume
• Motivation letter (max. 1 page) explaining why you want to join the group.

Applications will be reviewed on a rolling basis, and the position will be filled as soon as an excellent match is found. Online screening may be part of the selection process.

Diversity Code

ARCNL is committed to an inclusive and diverse work environment, aiming to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select based on competencies and talents and strongly encourage qualified individuals to apply, regardless of age, gender, origin, sexual orientation, or physical ability. Commercial activities in response to this ad are not appreciated.